1 option
Photomask and X-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan
- Format:
- Book
- Series:
- SPIE proceedings series Photomask and X-ray mask technology VI
- Language:
- English
- Subjects (All):
- Masks (Electronics)--Masks--Congresses.
- Masks (Electronics).
- Integrated circuits--Design and construction--Congresses.
- Integrated circuits.
- X-ray lithography--Congresses.
- X-ray lithography.
- Microlithography--Congresses.
- Microlithography.
- Optoelectronic devices--Congresses.
- Optoelectronic devices.
- Place of Publication:
- [Place of publication not identified] SPIE 1999
- Language Note:
- English
- Notes:
- Bibliographic Level Mode of Issuance: Monograph
The Penn Libraries is committed to describing library materials using current, accurate, and responsible language. If you discover outdated or inaccurate language, please fill out this feedback form to report it and suggest alternative language.