Photomask and X-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan

MLA

Morimoto, Hiraoki, BACUS (Technical group) and Photomask Japan. Photomask and X-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan. [Place of publication not identified] SPIE 1999

APA

Morimoto, H., BACUS (Technical group) & Photomask Japan. (1999). Photomask and X-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan. [Place of publication not identified] SPIE.

Chicago

Morimoto, Hiraoki, BACUS (Technical group) and Photomask Japan. Photomask and X-ray mask technology VI : 13-14 April, 1999, Yokohama, Japan. [Place of publication not identified] SPIE 1999