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Lithography for semiconductor manufacturing : microelectronic manufactoring technologies : 19-21 May 1999, Edinburgh, United Kingdom / editors, Chris A. Mack, Tom Stevenson ; sponsored by SPIE.
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; Volume 3741.
- Proceedings of SPIE ; Volume 3741
- Language:
- English
- Subjects (All):
- Lithography, Electron beam--Congresses.
- Lithography, Electron beam.
- Semiconductors--Etching--Congresses.
- Semiconductors.
- Physical Description:
- 1 online resource (262 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 1999.
- Notes:
- Description based on: online resource; title from title screen (SPIE Digital Library, viewed November 17, 2018).
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