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Metrology, inspection, and process control for microlithography XXXI : 27 February-2 March 2017, San Jose, California, United States / Martha I. Sanchez, Vladimir A. Ukraintsev, editors ; sponsored by SPIE.
- Format:
- Book
- Conference/Event
- Conference Name:
- Metrology, Inspection, and Process Control for Microlithography (Conference) (31st : 2017 : San Jose, Calif.)
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; 1996-756X. Volume 10145.
- Proceedings of SPIE ; Volume 10145
- Language:
- English
- Subjects (All):
- Integrated circuits--Inspection--Congresses.
- Integrated circuits.
- Integrated circuits--Measurement--Congresses.
- Microlithography--Congresses.
- Microlithography.
- Physical Description:
- 1 online resource (902 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 2017.
- Notes:
- Description based on: online resource; title from pdf title page (SPIE Digital Library, viewed November 22, 2018).
- ISBN:
- 1-5106-0742-0
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