1 option
Metrology, inspection, and process control for microlithography XXXI : 27 February-2 March 2017, San Jose, California, United States / Martha I. Sanchez, Vladimir A. Ukraintsev, editors ; sponsored by SPIE.
- Format:
- Book
- Conference/Event
- Conference Name:
- Metrology, Inspection, and Process Control for Microlithography (Conference) (31st : 2017 : San Jose, Calif.)
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; 1996-756X. Volume 10145.
- Proceedings of SPIE ; Volume 10145
- Language:
- English
- Subjects (All):
- Integrated circuits--Inspection--Congresses.
- Integrated circuits--Measurement--Congresses.
- Microlithography--Congresses.
- Physical Description:
- 1 online resource (902 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 2017.
- Notes:
- Description based on: online resource; title from pdf title page (SPIE Digital Library, viewed November 22, 2018).
- ISBN:
- 1-5106-0742-0
The Penn Libraries is committed to describing library materials using current, accurate, and responsible language. If you discover outdated or inaccurate language, please fill out this feedback form to report it and suggest alternative language.