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2002 7th International Symposium on Plasma- and Process-Induced Damage. June 5-7, 2002, Maui, Hawaii, USA / Terence Hook, Koji Eriguchi, and Calvin T. Gabriel, editors ; technical co-sponsors, AVS, IEEE/Electron Devices Society, Japanese Society of Applied Physics.
Connect to full text Available online
View online- Format:
- Book
- Conference/Event
- Conference Name:
- International Symposium on Plasma Process-Induced Damage (7th : 2002 : Maui, Hawaii)
- Language:
- English
- Subjects (All):
- Semiconductor wafers--Congresses.
- Semiconductor wafers.
- Semiconductors--Effect of radiation on--Congresses.
- Semiconductors.
- Semiconductors--Effect of radiation on.
- Plasma radiation--Congresses.
- Plasma radiation.
- Genre:
- Conference papers and proceedings.
- Physical Description:
- 6 unnumbered pages, i, 177 pages : illustrations
- Other Title:
- P²ID
- Plasma- and Process-Induced Damage, 2002 7th International Symposium on.
- Place of Publication:
- Santa Clara, Calif. : AVS, [2002]
- System Details:
- Mode of access: World Wide Web.
- text file
- Notes:
- Some previous Symposia entitled: International Symposium on Plasma Induced-Damage.
- "P²ID"--Cover.
- "IEEE Catalog Number (softbound) 02TH8582 ; IEEE Catalog Number (CD-ROM) 02TH8582C"--T.p. verso.
- Includes bibliographical references and author index.
- ISBN:
- 0965157776
- 9780965157773
- 0965157784
- 9780965157780
- OCLC:
- 50819437
- Access Restriction:
- Restricted for use by site license.
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