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Chemical vapor deposition for microelectronics : principles, technology, and applications / by Arthur Sherman.
LIBRA TS695 .S54 1987
Available from offsite location
- Format:
- Book
- Author/Creator:
- Sherman, Arthur, 1931-
- Series:
- Materials science and process technology series
- Materials science and process technology series.
- Language:
- English
- Subjects (All):
- Vapor-plating.
- Integrated circuits--Design and construction.
- Integrated circuits.
- Physical Description:
- xi, 215 pages : illustrations ; 25 cm.
- Place of Publication:
- Park Ridge, N.J., U.S.A. : Noyes Publications, [1987]
- Summary:
- Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics and kinetics, as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
- Notes:
- Includes bibliographies and index.
- ISBN:
- 0815511361 :
- OCLC:
- 15657978
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