Excimer Laser Micromachining/Marking Lambda Physik, Incorporated

Format:

Conference/Event

Author/Creator:

Scaggs, Michael J., author.

Conference Name:

Aerospace Technology Conference & Exposition (1989-09-25 : Anaheim, California, United States)

Language:

English

Physical Description:

1 online resource

Place of Publication:

Warrendale, PA SAE International 1989

Summary:

The present generation of industrial ultraviolet light (UV) excimer lasers are being used in a growing number of demanding production and prototype application work that had previously been beyond the capabilities of such thermal sources as CO2, operating at 10.6 μm, or Nd:YAG and Nd:Glass, operating at 1.06 μm range. The high photon energy and the very short duration of the excimer pulses can efficiently initiate photochemical and/or photothermal surface reactions leading to precision micromachining, indelible marking, and microstructure modification

Notes:

Vendor supplied data

Publisher Number:

892257

Access Restriction:

Restricted for use by site license