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A High-Breakdown Voltage n+-GaAs/δ (p+)-GaInP/n-GaAs Heterojunction Camel-Gate Transistor for Power System Applications National Cheng-Kung Univ
- Format:
- Conference/Event
- Author/Creator:
- Liu, W. C., author.
- Conference Name:
- 34th Intersociety Energy Conversion Engineering Conference (1999-08-02 : Vancouver, Canada)
- Language:
- English
- Physical Description:
- 1 online resource
- Place of Publication:
- Warrendale, PA SAE International 1999
- Summary:
- A high-breakdown-voltage n+-GaAs/δ (p+)-GaInP/n-GaAs camel-gate field-effect transistor with the triple-step doped-channel has been successfully fabricated and demonstrated. Experimentally, the high gate turn-on voltage of 1.6 V at a gate current of 1 mA/mm and a very high breakdown voltage of 40 V with the low gate leakage current of 400 μA/mm are obtained. The measured transconductance is 145 mS/mm with the current gain cut-off frequency fT of 17 GHz and the maximum oscillation frequency fmax of 33 GHz for a 1100 um2 device. Consequently, based on the remarkable experimental results, the studied device shows a promise for high-power circuit applications
- Notes:
- Vendor supplied data
- Publisher Number:
- 1999-01-2494
- Access Restriction:
- Restricted for use by site license
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