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A High-Breakdown Voltage n+-GaAs/δ (p+)-GaInP/n-GaAs Heterojunction Camel-Gate Transistor for Power System Applications National Cheng-Kung Univ

SAE Technical Papers (1906-current) Available online

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Format:
Conference/Event
Author/Creator:
Liu, W. C., author.
Conference Name:
34th Intersociety Energy Conversion Engineering Conference (1999-08-02 : Vancouver, Canada)
Language:
English
Physical Description:
1 online resource
Place of Publication:
Warrendale, PA SAE International 1999
Summary:
A high-breakdown-voltage n+-GaAs/δ (p+)-GaInP/n-GaAs camel-gate field-effect transistor with the triple-step doped-channel has been successfully fabricated and demonstrated. Experimentally, the high gate turn-on voltage of 1.6 V at a gate current of 1 mA/mm and a very high breakdown voltage of 40 V with the low gate leakage current of 400 μA/mm are obtained. The measured transconductance is 145 mS/mm with the current gain cut-off frequency fT of 17 GHz and the maximum oscillation frequency fmax of 33 GHz for a 1100 um2 device. Consequently, based on the remarkable experimental results, the studied device shows a promise for high-power circuit applications
Notes:
Vendor supplied data
Publisher Number:
1999-01-2494
Access Restriction:
Restricted for use by site license

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