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Crystal Research and Technology : Journal of Experimental and Industrial Crystallography / Zeitschrift für experimentelle und technische Kristallographie. Volume 23, Number 5, May / hrsg. von H. Neels.
- Format:
- Book
- Series:
- Crystal Research and Technology ; Volume 23, Number 5
- Language:
- German
- Physical Description:
- 1 online resource (148 p.)
- Edition:
- Reprint 2021
- Place of Publication:
- Berlin ; Boston : De Gruyter, [2022]
- Language Note:
- In German.
- Summary:
- Keine ausführliche Beschreibung für "May" verfügbar.
- Contents:
- Frontmatter
- Directions to the author
- Original Papers
- On the Morphological Instability of Growing Crystals (I) Morphological Peculiarities of the Transition Shapes of Crystals in Diffusioncontrolled Regime of Growth
- Polymorphic Transitions of Ice at a Pressure up to 2500 MPa in the Temperature Range 90—300 K
- High Pressure Phase Transformation in MnS
- Fluctuation Theory of the One-component and Binary Metallic Melt's Crystallization in the Case of Micro- and Macro-Systems
- Crystallization Kinetics of Lithium Niobate Films from Limited Volume of Melt Solution
- Inference of System Configurations on Thickness Homogeneity and Lateral Dopant Distribution of MBE Grown Films
- Metalorganic Chemical Vapour Deposition of Oriented ZnO Films
- Bridgman-Stockbarger Growth and Spectral Characteristics of Al2O3: Ti3+ Single Crystals
- Structure Refinement of Paranatrolite by X-ray Diffraction
- TC Anisotropy and Texture of Fine Niobium Wire and Foil
- Investigation on Synthesis, Characterization, and Electronic Behaviour of Zinc Oxide Thin Films in Relation to Fabrication of Oxygen Gas Sensor
- Infrared Optical Characterization of (Cu2GeSe3)1-x(CuGe2P3)x Mixed Crystals
- Interference Pattern of X-ray Waves inside the Crystal and its Image in Vacuum in Double-Field Approximation (I)
- Structural Energetics of the Intermetallic Compounds CaMg2 and CaAl2
- Radial Distortions of the Fermi Surfaces of Rubidium and Cesium
- Characterization of Plasma Etching of Molybdenum Polycid Conductor Stacks in Cl2/CF4 and Cl2/CF4/O2
- The K3[Fe(CN)6]-K0H-H2 O Photoetchant for InP
- A Suplementary Consideration of Lateral Autodoping
- Etch Pit Morphology in CdTe
- Backmatter
- Notes:
- Description based on online resource; title from PDF title page (publisher's Web site, viewed 31. Jan 2022)
- ISBN:
- 3-11-248546-7
- OCLC:
- 1294425067
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