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Electron beam induced damage in PECVD Si₃N₄ and SiO₂ films on InP / Dragan M. Pantie [and four others].

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Format:
Book
Government document
Author/Creator:
Pantic, Dragan M., author.
Contributor:
Lewis Research Center, issuing body.
Series:
NASA technical memorandum ; 102544.
NASA technical memorandum ; 102544
Language:
English
Genre:
Online resources.
Physical Description:
1 online resource (15 pages) : illustrations.
Place of Publication:
Cleveland, Ohio : National Aeronautics and Space Administration, Lewis Research Center, [1990]
Notes:
"Performing organization: National Aeronautics and Space Administration, Lewis Research Center"--Report documentation page.
Includes bibliographical references (page 13).
Online resource; title from PDF title page (NASA, viewed July 24, 2017).
Other Format:
Microfiche version: Electron beam induced damage in PECVD Si₃N₄ and SiO₂ films on InP
OCLC:
994303469

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