Patterning of Bi2Te3 Polycrystalline Thin-Films on Silicon / Brian Morgan and Patrick Taylor.

Format:

Book

Government document

Author/Creator:

Morgan, Brian, author.

Taylor, Patrick, author.

Contributor:

U.S. Army Research Laboratory, issuing body.

Series:

ARL-TR (Aberdeen Proving Ground, Md.) ; 4351.

ARL-TR ; 4351

Language:

English

Subjects (All):

Photoemission.

Nanostructured materials.

Thermoelectric materials.

Thermoelectric apparatus and appliances.

Nanostructures.

Medical Subjects:

Nanostructures.

Physical Description:

1 online resource (iv, 12 pages) : illustrations (some color)

Distribution:

Ft. Belvoir : Defense Technical Information Center, [between 2000 and 2009?]

Place of Publication:

Adelphi, MD : Army Research Laboratory, January 2008.

Summary:

Bi2Te3-based thermoelectric (TE) energy conversion devices are an attractive possibility for recovering usable energy from waste heat. The integration of TE devices on silicon substrates opens the door for new highly integrated systems where micro-electro-mechanical systems (MEMS) heat exchangers and sensor/actuator technology can be leveraged to improve conversion efficiency and system capability. One roadblock on this path is the development of reliable patterning methods for fabricating thin-film TE devices on silicon micromachined substrates. This report gives the results from investigating patterning techniques for polycrystalline Bi2Te3 films grown using molecular beam epitaxy (MBE). Lithographic patterning and both wet and dry etch techniques are discussed. Results show that the developed processes can be used to precisely pattern features smaller than 10 microns on a side and are scalable to vertical dimensions (>> or>) 10 microns.

Notes:

Title from title screen (viewed June 28, 2016).

Includes bibliographical references (page 10).

OCLC:

318681186