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Use of very-high-frequency plasmas to prepare a-Si:H-based triple-junction solar cells at high deposition rates : annual technical status report, 11 March 1998-11 March 1999 / S.J. Jones [and others].
Connect to full text Available online
View online- Format:
- Book
- Government document
- Series:
- NREL/SR ; 520-26795.
- NREL/SR ; 520-26795
- Language:
- English
- Subjects (All):
- Photovoltaic cells--Research.
- Photovoltaic cells.
- Solar cells.
- Thin films.
- Plasma-enhanced chemical vapor deposition.
- solar cells.
- Physical Description:
- 1 online resource (29 pages)
- Place of Publication:
- Golden, Colo. : National Renewable Energy Laboratory, [1999]
- Notes:
- Title from title screen (viewed June 20, 2008).
- "September 1999."
- "Subcontractor report."
- Other Format:
- Use of very-high-frequency plasma to prepare a-Si:H-based triple-junction solar cells at high deposition rates
- OCLC:
- 232361115
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