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Self-assembling nanomembranes through electrostatic melt processing of copolymer films / Eric D. Wetzel and Frederick L. Beyer.
- Format:
- Book
- Government document
- Author/Creator:
- Wetzel, Eric D.
- Series:
- ARL-TR (Aberdeen Proving Ground, Md.) ; 2800.
- ARL-TR ; 2800
- Language:
- English
- Subjects (All):
- Cell membranes--Microstructure.
- Cell membranes.
- Block copolymers--Microstructure.
- Block copolymers.
- Physical Description:
- 1 online resource (viii, 16 pages) : illustrations (some color).
- Place of Publication:
- Aberdeen Proving Ground, MD : Army Research Laboratory, [2002]
- Summary:
- Polystyrene-polyisobutylene-polystyrene (SIBS) block copolymer films have been electrostatically melt processed in order to induce a preferential orientation in the material microstructure. The results show that electrostatic melt processing is inducing some change in the microstructure, but full reorientation is not being achieved. The low dielectric contrast of the SIBS blocks as well as the relatively short electrostatic processing times are the likely causes of incomplete alignment.
- Notes:
- Title from title screen (viewed on Feb. 12, 2011).
- "August 2002."
- Includes bibliographical references (pages 17-18).
- OCLC:
- 74225054
- Access Restriction:
- APPROVED FOR PUBLIC RELEASE.
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