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Optical lithography for advanced semiconductor patterning / Peter De Bisschop.
- Format:
- Book
- Author/Creator:
- De Bisschop, Peter, author.
- Series:
- SPIE digital library
- SPIE monograph ; PM380.
- SPIE Press monograph ; PM380
- Language:
- English
- Subjects (All):
- Semiconductors--Etching.
- Semiconductors.
- Microlithography.
- Genre:
- Electronic books.
- Physical Description:
- 1 online resource (xxxiii,133 pages) : illustrations.
- Place of Publication:
- Bellingham, Washington : SPIE, 2025.
- System Details:
- Mode of access: World Wide Web.
- Summary:
- "Optical lithography is one of the key technologies in the fabrication of microchips. This book gives an account of modern lithography during the first half of the 2020s, when high-NA extreme-ultraviolet lithography (EUVL) was being introduced. Central to the book is a comprehensive description of the effects that impact the quality of the optical image inside the resist layer, a story that has become more complicated with every new lithography tool generation. This discussion builds gradually so that anyone with a graduate-type background in physics, chemistry, or mathematics can follow it from the start to the many subtleties of image formation in high-NA EUVL. It uses mathematics when useful and is accompanied by examples and case studies, many of which were created specifically for this book. This book will be of value for people who are new to lithography as well as for the more experienced lithographer."-- Provided by publisher.
- Contents:
- Introduction to optical lithography
- Patterning techniques
- Semiconductor applications: Logic and SRAM
- CMOS memory
- General design and key properties of the projection system
- Calculation of the image intensity: An initial treatment
- Periodic structures and resolution limits
- Defocus and focus-related topics
- Vector effects
- Thin-film effects
- M3D effects
- EUV-specific imaging topics
- Lens aberrations and other image disturbances
- Appendices to part 2
- Resist impact on lithographic-performance metrics
- Stochastic effects
- Computational lithography for full chip
- Notes:
- Includes bibliographical references and index.
- Title from PDF title page (SPIE eBooks Website, viewed 2025-06-13)
- Other Format:
- Print version:
- ISBN:
- 9781510680340
- 9781510680333
- OCLC:
- 1523346111
- Access Restriction:
- Restricted for use by site license.
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