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Efficient extreme ultraviolet mirror design : an FDTD approach / Yen-Min Lee.
- Format:
- Book
- Author/Creator:
- Lee, Yen-Min, author.
- Series:
- IOP series in advances in optics, photonics and optoelectronics.
- IOP Series in Advances in Optics, Photonics and Optoelectronics Series
- Language:
- English
- Subjects (All):
- Extreme ultraviolet lithography.
- Optics and photonics.
- Time-domain analysis.
- Physical Description:
- 1 online resource (112 pages)
- Edition:
- First edition.
- Place of Publication:
- Bristol, England : IOP Publishing Ltd, [2021]
- Summary:
- Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. It is an essential reference for EUV industry professionals.
- Contents:
- PRELIMS.pdf
- Preface
- Author biography
- Yen-Min Lee
- Abbreviations and symbols
- CH001.pdf
- Chapter 1 Introduction to optical lithography
- 1.1 Principle of optical lithography
- 1.2 Evolution and history
- 1.3 Interrelation with IC manufacturing
- 1.4 The next-generation optical lithography: extreme ultraviolet (EUV) lithography
- References
- CH002.pdf
- Chapter 2 Multilayer mirrors in extreme ultraviolet lithography
- 2.1 Composition and fabrication
- 2.1.1 ML mirror fabrication
- 2.1.2 Photomask fabrication
- 2.2 ML based EUV photomasks
- 2.3 Multilayer mirror physics
- 2.3.1 Literature review of high-reflectivity EUV mirror
- 2.3.2 EUV light interacts with ML mirror
- 2.3.3 Quick reflectivity assessment through one-dimensional analytical solution
- 2.4 Quarter-wavelength EUV mirror (Bragg mirror)
- 2.5 Photonic crystal (PHC) EUV mirror
- 2.5.1 Photonic crystals (PHC)
- 2.5.2 Bloch theorem
- 2.5.3 Quasi-two-dimensional PHC EUV mirror
- CH003.pdf
- Chapter 3 Efficient finite-difference time-domain (FDTD) approach Generated by AI.
- Notes:
- Description based on publisher supplied metadata and other sources.
- Part of the metadata in this record was created by AI, based on the text of the resource.
- Description based on print version record.
- Includes bibliographical references.
- ISBN:
- 9780750343893
- 0750343893
- OCLC:
- 1429725528
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