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International Conference on Extreme Ultraviolet Lithography 2024 / edited by Kurt G. Ronse [and four others].
- Format:
- Book
- Language:
- English
- Subjects (All):
- Lithography--Congresses.
- Lithography.
- Sustainable development--Congresses.
- Sustainable development.
- Physical Description:
- 1 online resource
- Place of Publication:
- Bellingham, Washington : Society of Photo-Optical Instrumentation Engineers (SPIE), 2024.
- Contents:
- Front Matter: Volume 13215
- Resist
- Computational Lithography
- Process Control for EUV
- Pellicle
- Joint Session with Photomask and EUVL: Prospects of EUV Blanks
- Resist Fundamentals
- Sustainability and Productivity
- Patterning, EPE and Defectivity
- Poster Session
- Errata: Volume 13215.
- Notes:
- Description based on publisher supplied metadata and other sources.
- ISBN:
- 1-5106-8156-6
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