1 option
International Conference on Extreme Ultraviolet Lithography 2024 / edited by Kurt G. Ronse [and four others].
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; volume PC13215.
- Proceedings of SPIE--the International Society for Optical Engineering ; ; volume PC13215
- Language:
- English
- Subjects (All):
- Sustainable development--Congresses.
- Sustainable development.
- Lithography--Congresses.
- Lithography.
- Physical Description:
- 1 online resource.
- Place of Publication:
- Bellingham, Washington : Society of Photo-Optical Instrumentation Engineers (SPIE), 2024.
- Contents:
- Monday All-Symposium Plenary
- Wednesday All-Symposium Plenary
- Joint Session with Photomask and EUVL: Prospects of Current and Future EUVL (2) Resist
- Computational Lithography
- Process Control for EUV
- Pellicle
- Joint Session with Photomask and EUVL: Prospects of EUV Blanks
- Resist Fundamentals
- Sustainability and Productivity
- Patterning, EPE and Defectivity
- Poster Session.
- Notes:
- Description based on publisher supplied metadata and other sources.
- ISBN:
- 1-5106-8666-5
The Penn Libraries is committed to describing library materials using current, accurate, and responsible language. If you discover outdated or inaccurate language, please fill out this feedback form to report it and suggest alternative language.