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Photomask Technology 2024 / Seong-Sue Kim, Lawrence S. Melvin III, editors.
- Format:
- Book
- Language:
- English
- Subjects (All):
- Integrated circuits--Masks--Congresses.
- Integrated circuits.
- Physical Description:
- 1 online resource
- Place of Publication:
- Bellingham, Washington : SPIE, 2024.
- Contents:
- Front Matter: Volume 13216 (1)
- Monday All-Symposium Plenary (1)
- Wednesday All-Symposium Plenary (1)
- Joint Session with Photomask and EUVL: Prospects of Current and Future EUVL (2)
- Blank and Etch (7)
- Mask Patterning (8)
- Inspection, Repair, and Cleaning (8)
- Mask Metrology (5)
- Defect, Printability, Handling, and Pellicle (6)
- Mask Writers and E-beam Resist (4)
- Joint Session with Photomask and EUVL: Prospects of EUV Blanks (3)
- AR/VR, Mask for Photonics, and Nano-imprint (7)
- Curvilinear Mask Technologies and MDP (7)
- Mask Design and Corrections (8)
- Poster Session (24).
- Notes:
- Description based on publisher supplied metadata and other sources.
- ISBN:
- 1-5106-8158-2
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