Quadrupoles in electron lens design / edited by Martin Hÿtch and Peter W. Hawkes.

Format:

Book

Contributor:

Hawkes, P. W., editor.

Hÿtch, Martin, editor.

Series:

Issn

Language:

English

Subjects (All):

Quadrupoles.

Electromagnetic lenses.

Physical Description:

1 online resource (400 pages)

Edition:

First edition.

Place of Publication:

London, England ; San Diego, California : Academic Press, [2023]

Summary:

Coulomb Interactions in Particle Beams, Volume 223 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and computing methods used in all these domains, with this release exploring Coulomb Interactions in Particle Beams. Provides the authority and expertise of leading contributors from an international board of authors Presents the latest release in the Advances in Imaging and Electron Physics series Updated release includes the latest information on Coulomb Interactions in Particle Beams.

Contents:

Intro

Quadrupoles in Electron Lens Design

Copyright

Contents

Preface

Chapter One: Introduction

Chapter Two: Definitions, notation, and methods of analysis

1. Equations of motion

2. Cardinal elements

2.1. Round lenses

2.2. Quadrupole lenses

2.2.1. Conjugate planes

2.2.2. Principal planes

3. Aberration coefficients: Round lenses

3.1. Real aberrations (objective lenses)

3.2. Asymptotic aberrations (lenses for which the object is virtual)

3.3. Aberration coefficients: Quadrupoles

3.4. Geometrical aberrations

3.5. Chromatic aberrations

3.6. Parasitic aberrations

4. Fifth-order aberrations

Chapter Three: Quadrupole potential functions

1. Calculation by analog and numerical methods

1.1. Relaxation

1.2. Analog methods

2. Curve-fitting and models

2.1. Best-fit curves

2.2. Electrode shape and fifth-order effects

2.3. Analytical models for which the equations of motion are soluble

3. Note added in proof

Chapter Four: Quadrupole systems: Their suitability for specific tasks

1. Quadrupole multiplets as corrector units

1.1. Doublets

1.2. Triplets

1.3. Quadruplets

2. Quadrupole multiplets as objective lenses or as probe-forming lenses

3. Quadrupoles as projector lenses

4. Formation of a line image and pseudo-stigmatic imagery

5. Octopoles alone

6. Chromatic correction

Chapter Five: Quadrupole data

1. The single quadrupole

1.1. Long quadrupoles: The rectangular model

1.2. The short quadrupole: The bell-shaped model

1.3. The short asymmetric quadrupole: the bell-shaped model

1.4. The intermediate quadrupole: The modified rectangular model

1.5. The short achromatic quadrupole

2. The quadrupole doublet

3. The quadrupole triplet

4. The quadrupole quadruplet

5. The symmetric quadruplet

6. The antisymmetric quadruplet.

6.1. Rectangular model, CDCD configuration

6.2. Rectangular model, CCDD configuration

6.3. The bell-shaped model

6.4. The rectangular model: telescopic systems

7. Other systems

7.1. General comments

7.2. Variational methods of minimizing aperture aberrations (Moses, 1968)

8. Octopoles

8.1. Individual octopoles

8.2. Combined quadrupoles and octopoles

Nomenclature and Notation

1. Nomenclature

2. Notation

The shadow projection method of measuring aberration coefficients

References

Author index

Subject index.

Notes:

Description based on print version record.

Includes bibliographical references and index.

Other Format:

Print version: Hÿtch, Martin Quadrupoles in Electron Lens Design

ISBN:

0-323-98866-0

OCLC:

1351749604