Optical and EUV lithography : a modeling perspective / Andreas Erdmann.

Format:

Book

Author/Creator:

Erdmann, Andreas, author.

Contributor:

Society of Photo-Optical Instrumentation Engineers, publisher.

Series:

SPIE monograph ; PM323.

SPIE Press monograph ; PM323

Language:

English

Subjects (All):

Photolithography.

Extreme ultraviolet lithography.

Physical Description:

1 online resource (xxii, 351 pages) : illustrations (some color)

Place of Publication:

Bellingham, Washington : SPIE, 2021.

System Details:

Mode of access: World Wide Web.

Summary:

State-of-the-art semiconductor lithography combines the most advanced optical systems of our world with cleverly designed and highly optimized photochemical materials and processes to fabricate micro- and nanostructures that enable our modern information society. The precise fabrication and characterization of nanopatterns requires an in-depth understanding of all involved physical and chemical effects. This book supports such an understanding from a model-driven perspective, but without a heavy mathematical emphasis. The material for the book was compiled during many years of lecturing on optical lithography technology, physical effects, and modeling at the Friedrich-Alexander-University Erlangen-Nuremberg and in preparation for dedicated courses on special aspects of lithography. The book is intended to introduce interested students with backgrounds in physics, optics, computational engineering, mathematics, chemistry, material science, nanotechnology, and other areas to the fascinating field of lithographic techniques for nanofabrication. It should also help senior engineers and managers expand their knowledge on alternative methods and applications.

Contents:

Preface

Abbreviations and acronyms

Frequently used symbols

1. Overview of lithographic processing

2. Image formation in projection lithography

3. Photoresists

4. Optical resolution enhancements

5. Material-driven resolution enhancements

6. Lithography with extreme-ultraviolet light

7. Optical lithography beyond projection imaging

8. Lithographic projection systems: advanced topics

9. Mask and wafer topography effects in lithography

10. Stochastic effects in advanced lithography

Index.

Notes:

"SPIE Digital Library."--Website.

Includes bibliographical references and index.

Title from PDF title screen (SPIE eBooks Website, viewed 2021-05-11).

Other Format:

Print version

ISBN:

9781510639027

1510639020

OCLC:

1198086774

Access Restriction:

Restricted for use by site license.