Updates in Advanced Lithography / edited by Sumio Hosaka.

Format:

• Book

Author/Creator:

• Hosaka, Sumio, Editor.

Contributor:

• Hosaka, Sumio, editor.

Language:

English

Subjects (All):

• Condensed matter.

Physical Description:

1 online resource (262 pages)

Place of Publication:

• IntechOpen 2013
• [Place of publication not identified] : IntechOpen, 2013.

Language Note:

English

Summary:

Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.

Notes:

• Description based on: online resource; title from PDF information screen (InTech, viewed October 19, 2022).
• Includes bibliographical references and index.

ISBN:

• 9789535157090
• 9535157094