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Strain-Engineered MOSFETs / C. K. Maiti, T. K. Maiti.
- Format:
- Book
- Author/Creator:
- Maiti, C. K., author.
- Maiti, T. K., author.
- Language:
- English
- Subjects (All):
- Technology.
- Genre:
- Electronic books.
- Physical Description:
- 1 online resource (1 pages)
- Other Title:
- Knowledge Unlatched.
- Place of Publication:
- Boca Raton : CRC Press, 2012.
- System Details:
- text file
- Summary:
- This book brings together new developments in the area of strain-engineered MOSFETs using high-mibility substrates such as SIGe, strained-Si, germanium-on-insulator and III-V semiconductors into a single text which will cover the materials aspects, principles, and design of advanced devices, their fabrication and applications. The book presents a full TCAD methodology for strain-engineering in Si CMOS technology involving data flow from process simulation to systematic process variability simulation and generation of SPICE process compact models for manufacturing for yield optimization.
- Notes:
- Description based on print version record.
- Local Notes:
- KU Select 2018: STEM Backlist Books
- BiblioBoard internal publisher id: 102701
- ISBN:
- 9781138075603
- Access Restriction:
- Open Access Unrestricted online access
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