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Implementation of simulation program for modeling the effective resistivity of nanometer scale film and line interconnects / A. Emre Yarimbiyik [and others].
- Format:
- Book
- Government document
- Series:
- NISTIR ; 7234.
- NISTIR ; 7234
- Language:
- English
- Subjects (All):
- Nanoelectromechanical systems.
- Thin films--Size effects--Computer simulation.
- Thin films.
- Thin films--Size effects.
- Computer simulation.
- Physical Description:
- 1 online resource (21 unnumbered pages) : illustrations.
- Place of Publication:
- [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology, [2006].
- System Details:
- text file
- Notes:
- "February 2006."
- Contributed record: Metadata reviewed, not verified. Some fields updated by batch processes.
- Title from page [1], viewed March 7, 2007.
- Includes bibliographical references.
- OCLC:
- 123128229
- Publisher Number:
- GOVPUB-C13-752d1bed8ba5e339a5dbbbe7614cc375
- Access Restriction:
- Open Access Unrestricted online access
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