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Standard reference materials : certification of a standard reference material for the determination of interstitial oxygen concentration in semiconductor silicon by infrared spectrophotometry / Brian G. Rennex.

National Institute of Standards and Technology (NIST) Publications Available online

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Format:
Book
Government document
Author/Creator:
Rennex, Brian G, author.
Contributor:
Rennex, Brian G.
National Institute of Standards and Technology (U.S.)
Series:
NIST special publication ; 260-121.
NIST special publication ; 260-121
Language:
English
Genre:
Technical reports.
Physical Description:
1 online resource.
Place of Publication:
Gaithersburg, MD : U.S. Dept. of Commerce, National Institute of Standards and Technology, 1994.
System Details:
text file
Notes:
1994.
Contributed record: Metadata reviewed, not verified. Some fields updated by batch processes.
Title from PDF title page.
Includes bibliographical references.
OCLC:
926748665
Publisher Number:
GOVPUB-C13-e38651e9eb4e18ac5cc1a793902c1aff
Access Restriction:
Open Access Unrestricted online access

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