2 options
Extreme Ultraviolet Lithography 2020 : 21-25 September 2020, online only, United States / Patrick P. Naulleau, [et al.], editors.
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; 11517.
- Proceedings of SPIE
- Language:
- English
- Subjects (All):
- Lithography--Congresses.
- Lithography.
- Physical Description:
- 1 online resource (164 pages).
- Place of Publication:
- Bellingham, Wash. : SPIE, [2020]
- Notes:
- Description based on publisher supplied metadata and other sources.
- ISBN:
- 1-5106-3843-1
- 1-5106-3844-X
The Penn Libraries is committed to describing library materials using current, accurate, and responsible language. If you discover outdated or inaccurate language, please fill out this feedback form to report it and suggest alternative language.