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Developments in semiconductor microlithography II : [seminar], April 4-5, 1977, San Jose, California / James W. Giffin, Bruce Ruff, editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with the International Society for Hybrid Microelectronics. [electronic resource]
- Format:
- Book
- Series:
- Proceedings of the Society of Photo-optical Instrumentation Engineers ; v. 100.
- Proceedings of the Society of Photo-optical Instrumentation Engineers ; v. 100
- Language:
- English
- Subjects (All):
- Semiconductors--Congresses.
- Semiconductors.
- Microlithography--Congresses.
- Microlithography.
- Physical Description:
- 1 online resource (viii, 176 p. ) ill. ;
- Place of Publication:
- Bellingham, Washington : SPIE, 1977.
- Notes:
- Includes bibliographical references and indexes.
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