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Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California / Phillip D. Blais, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group. [electronic resource]
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; Volume 393.
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 393
- Proceedings of SPIE ; Volume 393
- Language:
- English
- Subjects (All):
- Lithography, Electron beam--Congresses.
- Lithography, Electron beam.
- X-ray lithography--Congresses.
- X-ray lithography.
- Ion beam lithography--Congresses.
- Ion beam lithography.
- Physical Description:
- 1 online resource (viii, 242 p. ) ill. ;
- Place of Publication:
- Bellingham, Washington : SPIE, 1983.
- Notes:
- Includes bibliographical references and index.
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