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Photomask technology 2012 : 11-13 September 2012, Monterey, California, USA / Frank E. Abboud, Thomas B. Faure, editors ; sponsored by BACUS, SPIE.
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; 0277-786X. Volume 8522.
- Proceedings of SPIE ; Volume 8522
- Language:
- English
- Subjects (All):
- Integrated circuits--Masks--Congresses.
- Integrated circuits.
- Masks (Electronics)--Congresses.
- Masks (Electronics).
- Physical Description:
- 1 online resource (260 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 2012.
- Notes:
- Description based on: online resource; title from pdf title page (SPIE Digital Library, viewed December 4, 2018).
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