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Advances in resist technology and processing VI : 27 February-3 March 1989, San Jose, California, United States / editor, Elsa Reichmanis ; sponsored by SPIE.
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; Volume 1086.
- Proceedings of SPIE ; Volume 1086
- Language:
- English
- Subjects (All):
- Photoresists--Congresses.
- Photoresists.
- Microlithography--Congresses.
- Microlithography.
- Physical Description:
- 1 online resource (355 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 1989.
- Notes:
- Description based on: online resource; title from title screen (SPIE Digital Library, viewed November 7, 2018).
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