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Alternative lithographic technologies VI : 24-27 February 2014, San Jose, California, United States / Douglas J. Resnick, Christopher Bencher, editors ; sponsored by SPIE.
- Format:
- Book
- Conference/Event
- Conference Name:
- Alternative Lithographic Technologies (Conference) (6th : 2014 : San Jose, Calif.)
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; 0277-786X. Volume 9049.
- Proceedings of SPIE ; Volume 9049
- Language:
- English
- Subjects (All):
- Extreme ultraviolet lithography--Congresses.
- Extreme ultraviolet lithography.
- Lithography, Electron beam--Congresses.
- Lithography, Electron beam.
- Microlithography--Industrial applications--Congresses.
- Microlithography.
- Physical Description:
- 1 online resource (277 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 2014.
- Notes:
- Description based on: online resource; title from title screen (SPIE Digital Library, viewed October 20, 2018).
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