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Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing. III : 1-2 March 1993, San Jose, California / edited by David O. Patterson.
- Format:
- Book
- Language:
- English
- Subjects (All):
- Lithography, Electron beam--Congresses.
- Lithography, Electron beam.
- X-ray lithography--Congresses.
- X-ray lithography.
- Ion beam lithography--Congresses.
- Ion beam lithography.
- Semiconductors--Etching--Congresses.
- Semiconductors.
- Masks (Electronics)--Congresses.
- Masks (Electronics).
- Semiconductors--Etching.
- Physical Description:
- 1 online resource (vii, 470 pages) : illustrations
- Place of Publication:
- Bellingham, Wash. : SPIE, 1993.
- Contents:
- Resists for Manufacturing (6)
- Focused Ion Beams (4)
- Electron-Beam Lithography: Proximity Effects (4)
- Electron-Beam Lithography: Manufacturing (8)
- X-Ray Lithography: Integration (8)
- X-Ray Mask Technology (7)
- X-Ray Sources (4).
- Notes:
- Description based on publisher supplied metadata and other sources.
- ISBN:
- 0-8194-1158-2
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