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EUV, X-ray, and neutron optics and sources : 21-23 July 1999, Denver, Colorado
- Format:
- Book
- Series:
- SPIE proceedings series EUV, X-ray, and neutron optics and sources
- Language:
- English
- Subjects (All):
- X-ray optics--Congresses.
- X-ray optics.
- Extreme ultraviolet lithography--Congresses.
- Extreme ultraviolet lithography.
- Lithography, Electron beam--Congresses.
- Lithography, Electron beam.
- Ion beam lithography--Congresses.
- Ion beam lithography.
- Neutron sources--Congresses.
- Neutron sources.
- Place of Publication:
- [Place of publication not identified] SPIE 1999
- Language Note:
- English
- Notes:
- Bibliographic Level Mode of Issuance: Monograph
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