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EUV, X-ray, and gamma-ray instrumentation for astronomy X : SPIE's International Symposium on Optical Science, Engineering, and Instrumentation : 18-23 July 1999, Denver, CO, United States / editors, Oswald H. W. Siegmund, Kathryn A. Flanagan ; sponsored by SPIE.
- Format:
- Book
- Conference/Event
- Conference Name:
- International Symposium on Optical Science, Engineering, and Instrumentation (1999 : Denver, Colo.)
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; Volume 3765.
- Proceedings of SPIE ; Volume 3765
- Language:
- English
- Subjects (All):
- X-ray astronomy--Instruments--Congresses.
- X-ray astronomy.
- Gamma ray astronomy--Instruments--Congresses.
- Gamma ray astronomy.
- Physical Description:
- 1 online resource (xvi, 838 pages).
- Other Title:
- Extreme ultraviolet lithography, X-ray, and gamma-ray instrumentation for astronomy X
- Place of Publication:
- Bellingham, Washington : SPIE, 1999.
- Notes:
- Description based on: online resource; title from title screen (SPIE Digital Library, viewed November 7, 2018).
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