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Photomask technology 2013 : 10-12 September 2013, Monterey, California, United States / editors, Thomas B. Faure, Paul W. Ackmann ; sponsored by SPIE.
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; Volume 8880.
- Proceedings of SPIE ; Volume 8880
- Language:
- English
- Subjects (All):
- Integrated circuits--Masks--Congresses.
- Integrated circuits.
- Masks (Electronics)--Congresses.
- Masks (Electronics).
- Microlithography--Congresses.
- Microlithography.
- Genre:
- Conference papers and proceedings.
- Physical Description:
- 1 online resource (800 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 2013.
- Notes:
- Description based on: online resource; title from title screen (SPIE Digital Library, viewed December 4, 2018).
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