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Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies V : 1986 microlithography conferences : 10-12 March 1986, Santa Clara, United States / editor, Phillip D. Blais ; sponsored by SPIE.
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; Volume 0632.
- Proceedings of SPIE ; Volume 0632
- Language:
- English
- Subjects (All):
- X-ray lithography--Congresses.
- X-ray lithography.
- Ion beam lithography--Congresses.
- Ion beam lithography.
- Physical Description:
- 1 online resource (vi, 272 pages).
- Other Title:
- Electron-beam, x-ray, and ion-beam techniques for submicrometer lithographies V.
- Place of Publication:
- Bellingham, Washington : SPIE, 1986.
- Notes:
- Description based on: online resource; title from title screen (SPIE Digital Library, viewed November 7, 2018).
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