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Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : 12-16 March 1984, Santa Clara, California, United States / editor, Alfred Wagner ; sponsored by SPIE.
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; Volume 471.
- Proceedings of SPIE ; Volume 471
- Language:
- English
- Subjects (All):
- X-ray lithography--Congresses.
- X-ray lithography.
- Lithography, Electron beam--Congresses.
- Lithography, Electron beam.
- Physical Description:
- 1 online resource (136 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 1984.
- Notes:
- Description based on: online resource; title from title screen (SPIE Digital Library, viewed October 30, 2018).
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