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Metrology, inspection, and process control for microlithography XXIX : 23-26 February 2015, San Jose, California, United States / Jason P. Cain, Martha I. Sanchez, editors ; sponsored by SPIE.
- Format:
- Book
- Conference/Event
- Conference Name:
- Metrology, Inspection, and Process Control for Microlithography (Conference) (29th : 2015 : San Jose, Calif.)
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; 0277-786X. Volume 9424.
- Proceedings of SPIE ; Volume 9424
- Language:
- English
- Subjects (All):
- Integrated circuits--Inspection--Congresses.
- Integrated circuits.
- Integrated circuits--Measurement--Congresses.
- Microlithography--Congresses.
- Microlithography.
- Physical Description:
- 1 online resource (265 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 2015.
- Notes:
- Description based on: online resource; title from pdf title page (SPIE Digital Library, viewed November 22, 2018).
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