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Extreme ultraviolet (EUV) lithography VI : 23-26 February 2015, San Jose, California, United States / Obert R. Wood II, Eric M. Panning, editors ; sponsored by SPIE.
- Format:
- Book
- Conference/Event
- Conference Name:
- Extreme Ultraviolet (EUV) Lithography (Conference) (6th : 2015 : San Jose, Calif.)
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; 0277-786X. Volume 9422.
- Proceedings of SPIE ; Volume 9422
- Language:
- English
- Subjects (All):
- Extreme ultraviolet lithography--Congresses.
- Extreme ultraviolet lithography.
- Ultraviolet radiation--Industrial applications--Congresses.
- Ultraviolet radiation.
- Lasers--Industrial applications--Congresses.
- Lasers.
- Physical Description:
- 1 online resource (460 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 2015.
- Contents:
- Part one of two parts
- Part two of two parts.
- Notes:
- Description based on: online resource; title from pdf title page (SPIE Digital Library, viewed October 23, 2018).
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