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Optical microlithography XXIII : 23-25 February 2010, San Jose, California, United States
- Format:
- Book
- Series:
- Proceedings of SPIE Optical microlithography XXIII
- Language:
- English
- Subjects (All):
- Integrated circuits--Masks--Congresses.
- Integrated circuits.
- Microlithography--Congresses.
- Microlithography.
- X-ray lithography--Congresses.
- X-ray lithography.
- Manufacturing processes--Congresses.
- Manufacturing processes.
- Place of Publication:
- [Place of publication not identified] SPIE 2010
- Language Note:
- English
- Notes:
- Bibliographic Level Mode of Issuance: Monograph
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