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Advances in metrology for x-ray and EUV optics III : 1-2 August 2010, San Diego, California, United States
- Format:
- Book
- Series:
- Proceedings of SPIE Advances in metrology for x-ray and EUV optics III
- Language:
- English
- Subjects (All):
- Optical measurements--Design and construction--Congresses.
- Optical measurements.
- Optical instruments--Design and construction--Congresses.
- Optical instruments.
- Measuring instruments--Congresses.
- Measuring instruments.
- Laser interferometers--Congresses.
- Laser interferometers.
- Measurement--Congresses.
- Measurement.
- Place of Publication:
- [Place of publication not identified] SPIE 2010
- Language Note:
- English
- Notes:
- Bibliographic Level Mode of Issuance: Monograph
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