1 option
Extreme ultraviolet (EUV) lithography : 22-25 February 2010, San Jose, California, United States
- Format:
- Book
- Series:
- Proceedings of SPIE Extreme ultraviolet (EUV) lithography
- Language:
- English
- Subjects (All):
- Extreme ultraviolet lithography--Industrial applications--Congresses.
- Extreme ultraviolet lithography.
- Ultraviolet radiation--Industrial applications--Congresses.
- Ultraviolet radiation.
- Lasers--Congresses.
- Lasers.
- Photolithography--Congresses.
- Photolithography.
- Optical coatings--Congresses.
- Optical coatings.
- Other Title:
- Extreme Ultraviolet
- Place of Publication:
- [Place of publication not identified] SPIE 2010
- Language Note:
- English
- Notes:
- Bibliographic Level Mode of Issuance: Monograph
The Penn Libraries is committed to describing library materials using current, accurate, and responsible language. If you discover outdated or inaccurate language, please fill out this feedback form to report it and suggest alternative language.