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Photomask and next-generation lithography mask technology XIX : 17-19 April 2012, Yokohama, Japan / Kokoro Kato, edditor ; sponsored by PMJ Photomask Japan, BACUS, SPIE.
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; 0277-786X. Volume 8441.
- Proceedings of SPIE ; Volume 8441
- Language:
- English
- Subjects (All):
- Masks (Electronics)--Congresses.
- Masks (Electronics).
- Integrated circuits--Masks--Congresses.
- Integrated circuits.
- X-ray lithography--Congresses.
- X-ray lithography.
- Physical Description:
- 1 online resource (520 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 2012.
- Notes:
- Description based on: online resource; title from pdf title page (SPIE Digital Library, viewed December 3, 2018).
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