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Photomask technology 2007 : 18-21 September, 2007, Monterey, California, USA / Robert J. Naber, Hiroichi Kawahira, editors ; sponsored by BACUS, SPIE.
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; 0277-786X. Volume 6730.
- Proceedings of SPIE ; Volume 6730
- Language:
- English
- Subjects (All):
- Integrated circuits--Masks--Congresses.
- Integrated circuits.
- Microlithography--Congresses.
- Microlithography.
- Physical Description:
- 1 online resource (290 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 2007.
- Notes:
- Description based on: online resource; title from pdf title page (SPIE Digital Library, viewed December 4, 2018).
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