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Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California
- Format:
- Book
- Series:
- Proceedings / SPIE--the International Society for Optical Engineering Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing
- Language:
- English
- Subjects (All):
- Lithography, Electron beam--Congresses.
- Lithography, Electron beam.
- X-ray lithography--Congresses.
- X-ray lithography.
- Ion beam lithography--Congresses.
- Ion beam lithography.
- Place of Publication:
- [Place of publication not identified] SPIE 1991
- Language Note:
- English
- Notes:
- Bibliographic Level Mode of Issuance: Monograph
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