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Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IX : microlithography '90 : 4-8 March 1990, San Jose, CA, United States / editor, Douglas J. Resnick ; sponsored by SPIE.
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; Volume 1263.
- Proceedings of SPIE ; Volume 1263
- Language:
- English
- Subjects (All):
- X-ray lithography--Congresses.
- X-ray lithography.
- Ion beam lithography--Congresses.
- Ion beam lithography.
- Physical Description:
- 1 online resource (viii, 344 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 1990.
- Notes:
- Description based on: online resource; title from title screen (SPIE Digital Library, viewed November 7, 2018).
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