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X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography : 9-13 July 1990, San Diego, California
- Format:
- Book
- Conference/Event
- Conference Name:
- International Symposium on Optical and Optoelectronic Applied Sciences and Engineering (1990 : San Diego, Calif.)
- Series:
- Proceedings / SPIE--the International Society for Optical Engineering X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography
- Language:
- English
- Subjects (All):
- X-ray optics--Instruments--Congresses.
- X-ray optics.
- Extreme ultraviolet lithography--Instruments--Congresses.
- Extreme ultraviolet lithography.
- Coatings--Congresses.
- Coatings.
- Polarimetry--Congresses.
- Polarimetry.
- X-ray lithography--Congresses.
- X-ray lithography.
- Place of Publication:
- [Place of publication not identified] SPIE 1991
- Language Note:
- English
- Notes:
- Bibliographic Level Mode of Issuance: Monograph
- ISBN:
- 0-8194-0404-7
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