1 option
Advances in Patterning Materials and Processes XXXIV : 27 February-2 March 2017, San Jose, California, United States / Christoph K. Hohle, editor ; co-sponsored by Applied Materials, Inc. (United States).
- Format:
- Book
- Conference/Event
- Conference Name:
- Advances in Patterning Materials and Processes (Conference) (34th : 2017 : San Jose, Calif.)
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; 1996-756X. Volume 10146.
- Proceedings of SPIE ; Volume 10146
- Language:
- English
- Subjects (All):
- Photoresists--Congresses.
- Photoresists.
- Microlithography--Congresses.
- Microlithography.
- Genre:
- Conference papers and proceedings.
- Physical Description:
- 1 online resource (508 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 2017.
- Notes:
- Description based on: online resource; title from pdf title page (SPIE Digital Library, viewed October 18, 2018).
- ISBN:
- 1-5106-0744-7
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