International Conference on Extreme Ultraviolet Lithography 2018 / edited by Kurt G. Ronse [and four others].

Format:

Book

Contributor:

Naulleau, Patrick P., editor.

Itani, Toshiro, editor.

Hendrickx, Eric, editor.

Ronse, Kurt G., editor.

Gargini, Paolo A., editor.

Series:

Proceedings of SPIE--the International Society for Optical Engineering ; Volume 10809.

Proceedings of SPIE--the International Society for Optical Engineering ; Volume 10809

Language:

English

Subjects (All):

Extreme ultraviolet lithography.

Genre:

Conference papers and proceedings.

Physical Description:

1 online resource : illustrations.

Place of Publication:

Bellingham, Washington : SPIE, 2018.

Summary:

Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

Notes:

Description based on: online resource; title from PDF information screen (SAGE knowledge, viewed December 26, 2022).

ISBN:

1-5106-2214-4