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Integrated circuit metrology, inspection, and process control III : 1989 Santa Clara Symposium on Microlithography : 27 February-3 March 1989, San Jose, CA, United States / editor, Kevin M. Monahan ; sponsored by SPIE.
- Format:
- Book
- Conference/Event
- Conference Name:
- Symposium on Microlithography (1989 : San Jose, Calif.)
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; Volume 1087.
- Proceedings of SPIE ; Volume 1087
- Language:
- English
- Subjects (All):
- Integrated circuits--Congresses.
- Integrated circuits.
- Process control--Congresses.
- Process control.
- Physical Description:
- 1 online resource (x, 535 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 1989.
- Notes:
- Description based on: online resource; title from title screen (SPIE Digital Library, viewed November 13, 2018).
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