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Advances in resist materials and processing technology XXIX : 13-15 February 2012, San Jose, California, United States / Mark H. Somervell, Thomas I. Wallow, editors ; sponsored by SPIE.
- Format:
- Book
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; 0277-786X. Volume 8325.
- Proceedings of SPIE ; Volume 8325
- Language:
- English
- Subjects (All):
- Photoresists--Congresses.
- Photoresists.
- Microlithography--Congresses.
- Microlithography.
- Genre:
- Conference papers and proceedings.
- Physical Description:
- 1 online resource (686 pages).
- Place of Publication:
- Bellingham, Washington : SPIE, 2012.
- Notes:
- Description based on: online resource; title from pdf title page (SPIE Digital Library, viewed November 7, 2018).
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